MSE 548: Deposition Processing Of Thin Films And Coatings

3 credits

Fall 2025 Lecture Upper Division
Data from
Fall 2025
last updated 8/18/2025
Fall 2025 Instructors: ,

Processing and microstructural development of thin films and layered structures. Includes vapor, liquid, and reactive processing, as well as layer modification by annealing and beam techniques. Offered in alternate years.

Learning Outcomes

1List the detailed sequence of steps required for CVD (or sputter or MBE) film deposition and quantify the parametric dependence of these steps.

2Explain the process and film requirements for an epitaxial (or columnar or amorphous) film.

3Discuss the differences between different evaporation processes.

4Compare the advantages and disadvantages of techniques used to suppress reactivity (a) of the materials during deposition and (b) of the material with the substrate.

5Explain the importance of materials and process parameters during laser annealing.

6List material and process critical factors for specific films in at least three different functional classes of film applications.

7Communicate in detail the importance, use, and production method of a particular functional film in a manner understandable by other students.

8Explain the importance and critical issues involved in the following film deposition processes: CVD, PVD, Electrochemical, thermal spray, lithography.

9Explain the broad issues involved in processing each different type of material class: metals, ceramics, polymers, semiconductors, composites, and functionally graded materials.

Course MSE 548 from Purdue University - West Lafayette.

Prerequisites

One of
Student attribute GR

Restrictions

NOProfessionals
NOFreshmen (15-29 credits), Juniors (75-89 credits), Sophomores (45-59 credits)...show more

GPA by professor

3.9

No grades available

Other terms
Xing...(Fall 2019)
3.7
T

Haiyan Wang

001
10:30 am
Lec
R

Haiyan Wang

001
10:30 am
Lec

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MSE 548: Deposition Processing Of Thin Films And Coatings